There are 7 repositories under lithography topic.
Differentiable Computational Lithogrpahy Framework
GDSHelpers is an open-source package for automatized pattern generation for nano-structuring.
Github repository to share some insights about lithography simulation.
From Qiskit Metal to pattern generation to real nanofabrication demo. Here, quantum devices on a chip are patterned via direct-write electron-beam lithography in a nanofabrication facility. Written & patterned by Onri Jay Benally, an Indigenous American quantum hardware engineer.
MATLAB tools for Raith electron-beam lithography (EBL) and focused ion beam (FIB) systems — Outils MATLAB pour les systèmes Raith de lithographie par faisceau d'électrons et de faisceau d'ions focalisés
We use MixedWM38, the mixed-type wafer defect pattern dataset for wafer defect pattern regcognition with visual transformers.
Generate ASCII Job files for an ASML PAS 5500 Stepper Lithography system, by the UCSB Nanofabrication Facility.
Practical example from the SPIE short course "Data Analytics and Machine Learning in Semiconductor Manufacturing: Applications for Physical Design, Process and Yield Optimization"
MATLAB tools for Raith electron-beam lithography (EBL) and focused ion beam (FIB) systems — Outils MATLAB pour les systèmes Raith de lithographie par faisceau d'électrons et de faisceau d'ions focalisés
Lithography defect prediction for microchip manufacturing optimization with machine learning model
This is a comprehensive MATLAB-based software platform developed for real-time measurement and feedback control of a custom mask-projection photopolymerization based additive manufacturing system (referred as "ECPL", i.e., Exposure Controlled Projection Lithography) using a lab-built interferometry (referred as "ICM&M", i.e., Interferometric Curing Monitoring and Measurement). A graphical user interface using the graphical user interface development environment (GUIDE) of MATLAB was created to implement the ICM&M method for the ECPL process. The software interfaces with the hardware of the ECPL system’s ultraviolet lamp and DMD, and the ICM&M system’s camera. It was designed to streamline the operation of the ECPL process with the aid of parallel computing that implements online both the ICM&M acquisition and measurement analysis as well as the feedback control method. The application logs the acquired interferogram video data, performs numerical computations for the ICM&M measurement algorithms and control law, saves the real-time data and measurement results for all voxels in the region of interest. Meanwhile, it displays interferogram frames and visualize the photocuring process without a substantial sacrifice in temporal performance of other key functions such as data acquisition and measurement & control analysis. The software could be extended to real-time process measurement and control for other additive manufacturing systems, for example, metal based additive manufacturing aided by in-situ thermal images analysis.
Desktop app for lithography learning available for Windows, macOS, and Linux
Software used to write conductive nanostructures at the interface of LaAlO3 and SrTiO3
A C# library for reading, editing, and writing Calma GDSII files.
A model that can be plugged into a bigger model by T. Verduin. This model is able to simulate e-beam lithography, and this particular model implements the effect of bondbreaking in PMMA (plastic). This model has been done as part of the Bachelor thesis of Mels Habold for at ImPhys at Delft University of Technology in 2019.
Utilities for performing parallel and simultaneous lithography using an array of self-heating AFM cantilevers
Vector graphics based nanolithography tool for Asylum Research AFMs
Software for controlling the temperature of a self-heating AFM cantilever
Matlab GUI for manually tracing outlines of images