180nm-technology
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/ SCL-Project
This is the Repository which contains the detail of my work done at SCL Mohali (formerly Department of Space, ISRO). This was the internship basically focused on the "Experimental Analysis of MOS Capacitor for Oxide Furnaces" and further study of VLSI.
Language:HTML 2/ BAR2308TT
A SSI Digital IC based on 180nm technology that will give us outputs of all the Logic gates.